Highly reactive poly(2-oxazoline)-based photoresists with tunable properties

Martin Fimberger, Frank Wiesbrock

Research output: Contribution to journalArticleResearch

Original languageEnglish
Pages (from-to)547-Poly-547-Poly
JournalAbstracts of papers / American Chemical Society
Volume248
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

Cite this

Highly reactive poly(2-oxazoline)-based photoresists with tunable properties. / Fimberger, Martin; Wiesbrock, Frank.

In: Abstracts of papers / American Chemical Society, Vol. 248, 2014, p. 547-Poly-547-Poly.

Research output: Contribution to journalArticleResearch

@article{bafee15e81ff4023994b29106075599d,
title = "Highly reactive poly(2-oxazoline)-based photoresists with tunable properties",
author = "Martin Fimberger and Frank Wiesbrock",
year = "2014",
language = "English",
volume = "248",
pages = "547--Poly--547--Poly",
journal = "Abstracts of papers / American Chemical Society",
issn = "0065-7727",
publisher = "American Chemical Society",

}

TY - JOUR

T1 - Highly reactive poly(2-oxazoline)-based photoresists with tunable properties

AU - Fimberger, Martin

AU - Wiesbrock, Frank

PY - 2014

Y1 - 2014

M3 - Article

VL - 248

SP - 547-Poly-547-Poly

JO - Abstracts of papers / American Chemical Society

JF - Abstracts of papers / American Chemical Society

SN - 0065-7727

ER -