Highly reactive poly(2-oxazoline)-based photoresists with tunable properties

Martin Fimberger, Frank Wiesbrock

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)547-Poly-547-Poly
JournalAbstracts of papers / American Chemical Society
Volume248
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

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