Hierarchy of adhesion forces in patterns of photoreactive surface layers

Gregor Hlawacek, Quan Shen, Christian Teichert, Alexandra Lex, Gregor Trimmel, Wolfgang Kern

Research output: Contribution to journalArticleResearchpeer-review

Original languageGerman
Pages (from-to)044703/1-044703/5
JournalThe journal of chemical physics
Volume130
DOIs
Publication statusPublished - 2009

Treatment code (Nähere Zuordnung)

  • Experimental

Cite this

Hierarchy of adhesion forces in patterns of photoreactive surface layers. / Hlawacek, Gregor; Shen, Quan; Teichert, Christian; Lex, Alexandra; Trimmel, Gregor; Kern, Wolfgang.

In: The journal of chemical physics, Vol. 130, 2009, p. 044703/1-044703/5.

Research output: Contribution to journalArticleResearchpeer-review

Hlawacek, Gregor ; Shen, Quan ; Teichert, Christian ; Lex, Alexandra ; Trimmel, Gregor ; Kern, Wolfgang. / Hierarchy of adhesion forces in patterns of photoreactive surface layers. In: The journal of chemical physics. 2009 ; Vol. 130. pp. 044703/1-044703/5.
@article{607ebf948bc04c68a421bb5230ebf901,
title = "Hierarchy of adhesion forces in patterns of photoreactive surface layers",
author = "Gregor Hlawacek and Quan Shen and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",
year = "2009",
doi = "10.1063/1.3062841",
language = "deutsch",
volume = "130",
pages = "044703/1--044703/5",
journal = "The journal of chemical physics",
issn = "0021-9606",
publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Hierarchy of adhesion forces in patterns of photoreactive surface layers

AU - Hlawacek, Gregor

AU - Shen, Quan

AU - Teichert, Christian

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

PY - 2009

Y1 - 2009

U2 - 10.1063/1.3062841

DO - 10.1063/1.3062841

M3 - Artikel

VL - 130

SP - 044703/1-044703/5

JO - The journal of chemical physics

JF - The journal of chemical physics

SN - 0021-9606

ER -