Growth, structure and stability of sputter-deposited MoS2 thin films

Reinhard Kaindl, Bernhard C. Bayer, Roland Resel, Thomas Müller, Viera Skakalova, Gerlinde Habler, Rainer Abart, Alexey S. Cherevan, Dominik Eder, Maxime Blatter, Fabian Fischer, Jannik C. Meyer, Dmitry K. Polyushkin, Wolfgang Waldhauser

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1115-1126
JournalBeilstein Journal of Nanotechnology
Volume8
DOIs
Publication statusPublished - 2017

Cite this

Kaindl, R., Bayer, B. C., Resel, R., Müller, T., Skakalova, V., Habler, G., ... Waldhauser, W. (2017). Growth, structure and stability of sputter-deposited MoS2 thin films. Beilstein Journal of Nanotechnology , 8, 1115-1126. https://doi.org/10.3762/bjnano.8.113

Growth, structure and stability of sputter-deposited MoS2 thin films. / Kaindl, Reinhard; Bayer, Bernhard C.; Resel, Roland; Müller, Thomas; Skakalova, Viera; Habler, Gerlinde; Abart, Rainer; Cherevan, Alexey S.; Eder, Dominik; Blatter, Maxime; Fischer, Fabian; Meyer, Jannik C.; Polyushkin, Dmitry K.; Waldhauser, Wolfgang.

In: Beilstein Journal of Nanotechnology , Vol. 8, 2017, p. 1115-1126.

Research output: Contribution to journalArticleResearchpeer-review

Kaindl, R, Bayer, BC, Resel, R, Müller, T, Skakalova, V, Habler, G, Abart, R, Cherevan, AS, Eder, D, Blatter, M, Fischer, F, Meyer, JC, Polyushkin, DK & Waldhauser, W 2017, 'Growth, structure and stability of sputter-deposited MoS2 thin films' Beilstein Journal of Nanotechnology , vol. 8, pp. 1115-1126. https://doi.org/10.3762/bjnano.8.113
Kaindl, Reinhard ; Bayer, Bernhard C. ; Resel, Roland ; Müller, Thomas ; Skakalova, Viera ; Habler, Gerlinde ; Abart, Rainer ; Cherevan, Alexey S. ; Eder, Dominik ; Blatter, Maxime ; Fischer, Fabian ; Meyer, Jannik C. ; Polyushkin, Dmitry K. ; Waldhauser, Wolfgang. / Growth, structure and stability of sputter-deposited MoS2 thin films. In: Beilstein Journal of Nanotechnology . 2017 ; Vol. 8. pp. 1115-1126.
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title = "Growth, structure and stability of sputter-deposited MoS2 thin films",
author = "Reinhard Kaindl and Bayer, {Bernhard C.} and Roland Resel and Thomas M{\"u}ller and Viera Skakalova and Gerlinde Habler and Rainer Abart and Cherevan, {Alexey S.} and Dominik Eder and Maxime Blatter and Fabian Fischer and Meyer, {Jannik C.} and Polyushkin, {Dmitry K.} and Wolfgang Waldhauser",
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AU - Kaindl, Reinhard

AU - Bayer, Bernhard C.

AU - Resel, Roland

AU - Müller, Thomas

AU - Skakalova, Viera

AU - Habler, Gerlinde

AU - Abart, Rainer

AU - Cherevan, Alexey S.

AU - Eder, Dominik

AU - Blatter, Maxime

AU - Fischer, Fabian

AU - Meyer, Jannik C.

AU - Polyushkin, Dmitry K.

AU - Waldhauser, Wolfgang

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M3 - Article

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JO - Beilstein Journal of Nanotechnology

JF - Beilstein Journal of Nanotechnology

SN - 2190-4286

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