Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm

Wolfgang Ernst, C. Pollock, F. K. Tittel

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationTopical meeting on excimer lasers
Place of PublicationNew York
PublisherInstitute of Electrical and Electronics Engineers
PagesTU-A10/1-4-TU-A10/1-4
Publication statusPublished - 1979

Cite this

Ernst, W., Pollock, C., & Tittel, F. K. (1979). Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. In Topical meeting on excimer lasers (pp. TU-A10/1-4-TU-A10/1-4). New York: Institute of Electrical and Electronics Engineers.