Electrically detected magnetic resonance of carbon dangling bonds at the Si-face 4H-SiC/SiO2 interface

G. Gruber, J. Cottom, R. Meszaros, M. Koch, G. Pobegen, T. Aichinger, D. Peters, P. Hadley

Research output: Contribution to journalArticleResearchpeer-review

Abstract

SiC based metal-oxide-semiconductor field-effect transistors (MOSFETs) have gained a significant importance in power electronics applications. However, electrically active defects at the SiC/SiO2 interface degrade the ideal behavior of the devices. The relevant microscopic defects can be identified by electron paramagnetic resonance (EPR) or electrically detected magnetic resonance (EDMR). This helps to decide which changes to the fabrication process will likely lead to further increases of device performance and reliability. EDMR measurements have shown very similar dominant hyperfine (HF) spectra in differently processed MOSFETs although some discrepancies were observed in the measured g-factors. Here, the HF spectra measured of different SiC MOSFETs are compared, and it is argued that the same dominant defect is present in all devices. A comparison of the data with simulated spectra of the C dangling bond (PbC) center and the silicon vacancy (VSi) demonstrates that the PbC center is a more suitable candidate to explain the observed HF spectra.

Original languageEnglish
Article number161514
JournalJournal of Applied Physics
Volume123
Issue number16
DOIs
Publication statusPublished - 28 Apr 2018

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fields of Expertise

  • Advanced Materials Science

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