Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealing
performance.
Original languageEnglish
Title of host publicationIFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress
Number of pages6
Publication statusAccepted/In press - 13 Jul 2020
Event21st IFAC World Congress - Virtuell, Germany
Duration: 12 Jul 202017 Jul 2020

Conference

Conference21st IFAC World Congress
Abbreviated titleIFAC 2020
CountryGermany
CityVirtuell
Period12/07/2017/07/20

Keywords

  • subspace observer design
  • Lyapunov exponents
  • Nonlinear systems
  • Extended Kalman-Bucy Filter
  • linear time varying systems
  • reduced Riccati equation
  • wafer temperature estimation
  • rapid thermal processing

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