Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer

S. Schaltin, L. D´UZrzo, Q. Zhao, Harald Plank, Gerald Kothleitner, Christian Gspan, K. Binnemans, J. Fransaer

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	13624-13629
Journal	Physical Chemistry, Chemical Physics
Volume	14
Issue number	39
DOIs	https://doi.org/10.1039/c2cp41786c
Publication status	Published - 2012

Fields of Expertise

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title = "Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer",

author = "S. Schaltin and L. D´UZrzo and Q. Zhao and Harald Plank and Gerald Kothleitner and Christian Gspan and K. Binnemans and J. Fransaer",

year = "2012",

doi = "10.1039/c2cp41786c",

language = "English",

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journal = "Physical Chemistry, Chemical Physics",

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T1 - Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer

AU - Schaltin, S.

AU - D´UZrzo, L.

AU - Zhao, Q.

AU - Plank, Harald

AU - Kothleitner, Gerald

AU - Gspan, Christian

AU - Binnemans, K.

AU - Fransaer, J.

PY - 2012

Y1 - 2012

U2 - 10.1039/c2cp41786c

DO - 10.1039/c2cp41786c

M3 - Article

SN - 1463-9084

VL - 14

SP - 13624

EP - 13629

JO - Physical Chemistry, Chemical Physics

JF - Physical Chemistry, Chemical Physics

IS - 39

ER -