Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer

S. Schaltin, L. D´UZrzo, Q. Zhao, Harald Plank, Gerald Kothleitner, Christian Gspan, K. Binnemans, J. Fransaer

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)13624-13629
JournalPhysical chemistry, chemical physics
Volume14
Issue number39
DOIs
Publication statusPublished - 2012

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

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