Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer

S. Schaltin, L. D´UZrzo, Q. Zhao, Harald Plank, Gerald Kothleitner, Christian Gspan, K. Binnemans, J. Fransaer

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)13624-13629
JournalPhysical chemistry, chemical physics
Volume14
Issue number39
DOIs
Publication statusPublished - 2012

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer. / Schaltin, S.; D´UZrzo, L.; Zhao, Q.; Plank, Harald; Kothleitner, Gerald; Gspan, Christian; Binnemans, K.; Fransaer, J.

In: Physical chemistry, chemical physics, Vol. 14, No. 39, 2012, p. 13624-13629.

Research output: Contribution to journalArticleResearchpeer-review

Schaltin, S. ; D´UZrzo, L. ; Zhao, Q. ; Plank, Harald ; Kothleitner, Gerald ; Gspan, Christian ; Binnemans, K. ; Fransaer, J. / Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer. In: Physical chemistry, chemical physics. 2012 ; Vol. 14, No. 39. pp. 13624-13629.
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AU - Plank, Harald

AU - Kothleitner, Gerald

AU - Gspan, Christian

AU - Binnemans, K.

AU - Fransaer, J.

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SN - 1463-9076

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