[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

Frank Wiesbrock (Inventor), Franz Stelzer (Inventor), Verena Schenk (Inventor), Lisa Ellmaier (Inventor)

Research output: Patent

Original languageEnglish
Patent numberWO 2013/036979 A1
Publication statusPublished - 21 Mar 2013

Fields of Expertise

  • Advanced Materials Science

Projects

Generation of Smooth Surfaces Employing Polymer-Based Coatings

Rupp, B., Bodner, T., Bohnemann, K., Wiesbrock, F. & Stelzer, F.

1/07/0931/12/09

Project: Research project

Cite this

Wiesbrock, F., Stelzer, F., Schenk, V., & Ellmaier, L. (2013). [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE. (Patent No. WO 2013/036979 A1).