Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices

Finn Zahari; Felix Schichting; Julian Strobel; Sven Dirkmann; Julia Cipo; Sven Gauter; Jan Trieschmann; Richard Marquardt; Georg Haberfehlner; Gerald Kothleitner; Lorenz Kienle; Thomas Mussenbrock; Martin Ziegler; Holger Kersten; Hermann Kohlstedt

doi:10.1116/1.5119984

Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices

Finn Zahari, Felix Schichting, Julian Strobel, Sven Dirkmann, Julia Cipo, Sven Gauter, Jan Trieschmann, Richard Marquardt, Georg Haberfehlner, Gerald Kothleitner, Lorenz Kienle, Thomas Mussenbrock, Martin Ziegler, Holger Kersten, Hermann Kohlstedt

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	061203
Number of pages	11
Journal	Journal of Vacuum Science and Technology B. Nanotechnology & Microelectronics
Volume	2019
Issue number	37
DOIs	https://doi.org/10.1116/1.5119984
Publication status	Published - 2019

ASJC Scopus subject areas

Materials Science(all)

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1116/1.5119984Licence: Unspecified

Cite this

Zahari, F., Schichting, F., Strobel, J., Dirkmann, S., Cipo, J., Gauter, S., Trieschmann, J., Marquardt, R., Haberfehlner, G., Kothleitner, G., Kienle, L., Mussenbrock, T., Ziegler, M., Kersten, H., & Kohlstedt, H. (2019). Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices. Journal of Vacuum Science and Technology B. Nanotechnology & Microelectronics, 2019(37), 061203. https://doi.org/10.1116/1.5119984

Zahari, F, Schichting, F, Strobel, J, Dirkmann, S, Cipo, J, Gauter, S, Trieschmann, J, Marquardt, R, Haberfehlner, G , Kothleitner, G, Kienle, L, Mussenbrock, T, Ziegler, M, Kersten, H & Kohlstedt, H 2019, 'Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices', Journal of Vacuum Science and Technology B. Nanotechnology & Microelectronics, vol. 2019, no. 37, pp. 061203. https://doi.org/10.1116/1.5119984

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author = "Finn Zahari and Felix Schichting and Julian Strobel and Sven Dirkmann and Julia Cipo and Sven Gauter and Jan Trieschmann and Richard Marquardt and Georg Haberfehlner and Gerald Kothleitner and Lorenz Kienle and Thomas Mussenbrock and Martin Ziegler and Holger Kersten and Hermann Kohlstedt",

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T1 - Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices

AU - Zahari, Finn

AU - Schichting, Felix

AU - Strobel, Julian

AU - Dirkmann, Sven

AU - Cipo, Julia

AU - Gauter, Sven

AU - Trieschmann, Jan

AU - Marquardt, Richard

AU - Haberfehlner, Georg

AU - Kothleitner, Gerald

AU - Kienle, Lorenz

AU - Mussenbrock, Thomas

AU - Ziegler, Martin

AU - Kersten, Holger

AU - Kohlstedt, Hermann

PY - 2019

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DO - 10.1116/1.5119984

M3 - Article

SN - 0734-211X

VL - 2019

SP - 061203

JO - Journal of Vacuum Science and Technology B. Nanotechnology & Microelectronics

JF - Journal of Vacuum Science and Technology B. Nanotechnology & Microelectronics

IS - 37

ER -