Copper oxidation studied by in Situ Raman Spectroscopy

Robert Schennach, Andreas Gupper

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationMaterials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003
Publisher.
PagesE3.2.1-E3.2.6
Publication statusPublished - 2003
EventMaterials Research Society symposium proceedings - San Francisco, United States
Duration: 20 Mar 200325 Mar 2003

Conference

ConferenceMaterials Research Society symposium proceedings
CountryUnited States
CitySan Francisco
Period20/03/0325/03/03

Cite this

Schennach, R., & Gupper, A. (2003). Copper oxidation studied by in Situ Raman Spectroscopy. In Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003 (pp. E3.2.1-E3.2.6). ..

Copper oxidation studied by in Situ Raman Spectroscopy. / Schennach, Robert; Gupper, Andreas.

Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003. ., 2003. p. E3.2.1-E3.2.6.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Schennach, R & Gupper, A 2003, Copper oxidation studied by in Situ Raman Spectroscopy. in Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003. ., pp. E3.2.1-E3.2.6, Materials Research Society symposium proceedings, San Francisco, United States, 20/03/03.
Schennach R, Gupper A. Copper oxidation studied by in Situ Raman Spectroscopy. In Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003. . 2003. p. E3.2.1-E3.2.6
Schennach, Robert ; Gupper, Andreas. / Copper oxidation studied by in Situ Raman Spectroscopy. Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003. ., 2003. pp. E3.2.1-E3.2.6
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