Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer

Harald Etschmaier, Peter Pacher, Alexandra Lex, Gregor Trimmel, Christian Slugovc, Egbert Zojer

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)43-48
JournalApplied Physics / A
Volume95
Publication statusPublished - 2009

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

Cite this

Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer. / Etschmaier, Harald; Pacher, Peter; Lex, Alexandra; Trimmel, Gregor; Slugovc, Christian; Zojer, Egbert.

In: Applied Physics / A, Vol. 95, 2009, p. 43-48.

Research output: Contribution to journalArticleResearchpeer-review

@article{4b997761f23947fab8f6e26fa269bb30,
title = "Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer",
author = "Harald Etschmaier and Peter Pacher and Alexandra Lex and Gregor Trimmel and Christian Slugovc and Egbert Zojer",
year = "2009",
language = "English",
volume = "95",
pages = "43--48",
journal = "Applied Physics / A",
issn = "0947-8396",
publisher = "Springer Heidelberg",

}

TY - JOUR

T1 - Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer

AU - Etschmaier, Harald

AU - Pacher, Peter

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Slugovc, Christian

AU - Zojer, Egbert

PY - 2009

Y1 - 2009

M3 - Article

VL - 95

SP - 43

EP - 48

JO - Applied Physics / A

JF - Applied Physics / A

SN - 0947-8396

ER -