Conformational Properties of 1-Halogenated-1-Silacyclohexanes, C5H10SiHX (X = Cl, Br, I): Gas Electron Diffraction, Low-Temperature NMR, Temperature-Dependent Raman Spectroscopy, and Quantum-Chemical Calculations

SunnaÓ. Wallevik, Ragnar Bjornsson, Águśt Kvaran, Sigridur Jonsdottir, Ingvar Arnason, alexander V. Belyakov, Thomas Kern, Karl Hassler

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)6996-7005
JournalOrganometallics
Volume32
DOIs
Publication statusPublished - 2013

Fields of Expertise

  • Sonstiges

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Theoretical
  • Experimental

Cite this

Conformational Properties of 1-Halogenated-1-Silacyclohexanes, C5H10SiHX (X = Cl, Br, I): Gas Electron Diffraction, Low-Temperature NMR, Temperature-Dependent Raman Spectroscopy, and Quantum-Chemical Calculations. / Wallevik, SunnaÓ.; Bjornsson, Ragnar; Kvaran, Águśt; Jonsdottir, Sigridur; Arnason, Ingvar; Belyakov, alexander V.; Kern, Thomas; Hassler, Karl.

In: Organometallics, Vol. 32, 2013, p. 6996-7005.

Research output: Contribution to journalArticleResearchpeer-review

Wallevik, SunnaÓ. ; Bjornsson, Ragnar ; Kvaran, Águśt ; Jonsdottir, Sigridur ; Arnason, Ingvar ; Belyakov, alexander V. ; Kern, Thomas ; Hassler, Karl. / Conformational Properties of 1-Halogenated-1-Silacyclohexanes, C5H10SiHX (X = Cl, Br, I): Gas Electron Diffraction, Low-Temperature NMR, Temperature-Dependent Raman Spectroscopy, and Quantum-Chemical Calculations. In: Organometallics. 2013 ; Vol. 32. pp. 6996-7005.
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AU - Wallevik, SunnaÓ.

AU - Bjornsson, Ragnar

AU - Kvaran, Águśt

AU - Jonsdottir, Sigridur

AU - Arnason, Ingvar

AU - Belyakov, alexander V.

AU - Kern, Thomas

AU - Hassler, Karl

PY - 2013

Y1 - 2013

U2 - 10.1021/om4005725 |

DO - 10.1021/om4005725 |

M3 - Article

VL - 32

SP - 6996

EP - 7005

JO - Organometallics

JF - Organometallics

SN - 0276-7333

ER -