Co-sputtered films within the quasi-binary system TiN-TiB2

P Losbichler, Christian Mitterer, P.N. Gibson, W Gissler, Ferdinand Hofer, Peter Warbichler

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)297-302
JournalSurface & coatings technology
Volume94-95
Publication statusPublished - 1997

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

Cite this

Losbichler, P., Mitterer, C., Gibson, P. N., Gissler, W., Hofer, F., & Warbichler, P. (1997). Co-sputtered films within the quasi-binary system TiN-TiB2. Surface & coatings technology, 94-95, 297-302.

Co-sputtered films within the quasi-binary system TiN-TiB2. / Losbichler, P; Mitterer, Christian; Gibson, P.N.; Gissler, W; Hofer, Ferdinand; Warbichler, Peter.

In: Surface & coatings technology, Vol. 94-95, 1997, p. 297-302.

Research output: Contribution to journalArticleResearchpeer-review

Losbichler, P, Mitterer, C, Gibson, PN, Gissler, W, Hofer, F & Warbichler, P 1997, 'Co-sputtered films within the quasi-binary system TiN-TiB2' Surface & coatings technology, vol. 94-95, pp. 297-302.
Losbichler P, Mitterer C, Gibson PN, Gissler W, Hofer F, Warbichler P. Co-sputtered films within the quasi-binary system TiN-TiB2. Surface & coatings technology. 1997;94-95:297-302.
Losbichler, P ; Mitterer, Christian ; Gibson, P.N. ; Gissler, W ; Hofer, Ferdinand ; Warbichler, Peter. / Co-sputtered films within the quasi-binary system TiN-TiB2. In: Surface & coatings technology. 1997 ; Vol. 94-95. pp. 297-302.
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AU - Warbichler, Peter

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