Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

Alexandra Lex, Peter Pacher, Susanne Temmel, Quan Shen, Gregor Hlawacek, Oliver Werzer, Anna Maria Track, Paul Frank, Veronika Proschek, Robert Schennach, Georg Koller, Michael Ramsey, Christian Teichert, Roland Resel, Adolf Winkler, Egbert Zojer, Wolfgang Kern, Gregor Trimmel

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationMaterials Research Society Fall Meeting
Publisher.
Pages231-231
Publication statusPublished - 2007
EventMaterials Research Society Fall Meeting - Boston, United States
Duration: 26 Nov 200730 Nov 2007

Conference

ConferenceMaterials Research Society Fall Meeting
CountryUnited States
CityBoston
Period26/11/0730/11/07

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

Cite this

Lex, A., Pacher, P., Temmel, S., Shen, Q., Hlawacek, G., Werzer, O., ... Trimmel, G. (2007). Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. In Materials Research Society Fall Meeting (pp. 231-231). ..

Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. / Lex, Alexandra; Pacher, Peter; Temmel, Susanne; Shen, Quan; Hlawacek, Gregor; Werzer, Oliver; Track, Anna Maria; Frank, Paul; Proschek, Veronika; Schennach, Robert; Koller, Georg; Ramsey, Michael; Teichert, Christian; Resel, Roland; Winkler, Adolf; Zojer, Egbert; Kern, Wolfgang; Trimmel, Gregor.

Materials Research Society Fall Meeting. ., 2007. p. 231-231.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Lex, A, Pacher, P, Temmel, S, Shen, Q, Hlawacek, G, Werzer, O, Track, AM, Frank, P, Proschek, V, Schennach, R, Koller, G, Ramsey, M, Teichert, C, Resel, R, Winkler, A, Zojer, E, Kern, W & Trimmel, G 2007, Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. in Materials Research Society Fall Meeting. ., pp. 231-231, Materials Research Society Fall Meeting, Boston, United States, 26/11/07.
Lex A, Pacher P, Temmel S, Shen Q, Hlawacek G, Werzer O et al. Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. In Materials Research Society Fall Meeting. . 2007. p. 231-231
Lex, Alexandra ; Pacher, Peter ; Temmel, Susanne ; Shen, Quan ; Hlawacek, Gregor ; Werzer, Oliver ; Track, Anna Maria ; Frank, Paul ; Proschek, Veronika ; Schennach, Robert ; Koller, Georg ; Ramsey, Michael ; Teichert, Christian ; Resel, Roland ; Winkler, Adolf ; Zojer, Egbert ; Kern, Wolfgang ; Trimmel, Gregor. / Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. Materials Research Society Fall Meeting. ., 2007. pp. 231-231
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author = "Alexandra Lex and Peter Pacher and Susanne Temmel and Quan Shen and Gregor Hlawacek and Oliver Werzer and Track, {Anna Maria} and Paul Frank and Veronika Proschek and Robert Schennach and Georg Koller and Michael Ramsey and Christian Teichert and Roland Resel and Adolf Winkler and Egbert Zojer and Wolfgang Kern and Gregor Trimmel",
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AU - Pacher, Peter

AU - Temmel, Susanne

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Werzer, Oliver

AU - Track, Anna Maria

AU - Frank, Paul

AU - Proschek, Veronika

AU - Schennach, Robert

AU - Koller, Georg

AU - Ramsey, Michael

AU - Teichert, Christian

AU - Resel, Roland

AU - Winkler, Adolf

AU - Zojer, Egbert

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

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