Chemical vapour deposition of zeolitic imidazolate framework thin films

Ivo Stassen, Mark Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe Vereecken, Rob Ameloot*

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.

Original languageEnglish
Pages (from-to)304-310
Number of pages7
JournalNature Materials
Volume15
Issue number3
DOIs
Publication statusPublished - 1 Mar 2016
Externally publishedYes

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Condensed Matter Physics
  • Materials Science(all)
  • Chemistry(all)

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