Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films

Thomas E. Hamedinger, Thomas Steindl, Robert Saf

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publication7th International Conference on Nanostructured Materials - LMC
Place of PublicationFrankfurt am Main/Germany
PublisherDruckhaus K. Schmitt Wwe.
Pages35-35
Publication statusPublished - 2004

Cite this

Hamedinger, T. E., Steindl, T., & Saf, R. (2004). Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. In 7th International Conference on Nanostructured Materials - LMC (pp. 35-35). Frankfurt am Main/Germany: Druckhaus K. Schmitt Wwe..

Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. / Hamedinger, Thomas E.; Steindl, Thomas; Saf, Robert.

7th International Conference on Nanostructured Materials - LMC. Frankfurt am Main/Germany : Druckhaus K. Schmitt Wwe., 2004. p. 35-35.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Hamedinger, TE, Steindl, T & Saf, R 2004, Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. in 7th International Conference on Nanostructured Materials - LMC. Druckhaus K. Schmitt Wwe., Frankfurt am Main/Germany, pp. 35-35.
Hamedinger TE, Steindl T, Saf R. Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. In 7th International Conference on Nanostructured Materials - LMC. Frankfurt am Main/Germany: Druckhaus K. Schmitt Wwe. 2004. p. 35-35
Hamedinger, Thomas E. ; Steindl, Thomas ; Saf, Robert. / Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. 7th International Conference on Nanostructured Materials - LMC. Frankfurt am Main/Germany : Druckhaus K. Schmitt Wwe., 2004. pp. 35-35
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