Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films

Thomas E. Hamedinger, Thomas Steindl, Robert Saf

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publication7th International Conference on Nanostructured Materials - LMC
Place of PublicationFrankfurt am Main/Germany
PublisherDruckhaus K. Schmitt Wwe.
Pages35-35
Publication statusPublished - 2004

Cite this

Hamedinger, T. E., Steindl, T., & Saf, R. (2004). Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. In 7th International Conference on Nanostructured Materials - LMC (pp. 35-35). Frankfurt am Main/Germany: Druckhaus K. Schmitt Wwe..