Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems

David Egger, Egbert Zojer

Research output: Contribution to conferencePosterResearch

Original languageEnglish
Publication statusPublished - 2013
Event"Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII) - Rehovot, Israel
Duration: 28 Apr 20132 May 2013

Conference

Conference"Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII)
CityRehovot, Israel
Period28/04/132/05/13

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Theoretical

Cite this

Egger, D., & Zojer, E. (2013). Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems. Poster session presented at "Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII), Rehovot, Israel, .

Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems. / Egger, David; Zojer, Egbert.

2013. Poster session presented at "Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII), Rehovot, Israel, .

Research output: Contribution to conferencePosterResearch

Egger, D & Zojer, E 2013, 'Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems' "Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII), Rehovot, Israel, 28/04/13 - 2/05/13, .
Egger D, Zojer E. Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems. 2013. Poster session presented at "Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII), Rehovot, Israel, .
Egger, David ; Zojer, Egbert. / Anti-correlation between molecular dipoles and work-function changes in self-assembled monolayers of donor-acceptor systems. Poster session presented at "Electronic Structure and Processes at Molecular-Based Interfaces" (ESPMI VII), Rehovot, Israel, .
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