Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen

Pawel Tomkiewicz, Adolf Winkler, M Krzywiecki, Thomas Chasse, Josef Szuber

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)8035-8040
JournalApplied Surface Science
Volume254
DOIs
Publication statusPublished - 2008

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

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