Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen

Pawel Tomkiewicz, Adolf Winkler, M Krzywiecki, Thomas Chasse, Josef Szuber

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)8035-8040
JournalApplied Surface Science
Volume254
DOIs
Publication statusPublished - 2008

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

Cite this

Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen. / Tomkiewicz, Pawel; Winkler, Adolf; Krzywiecki, M; Chasse, Thomas; Szuber, Josef.

In: Applied Surface Science, Vol. 254, 2008, p. 8035-8040.

Research output: Contribution to journalArticleResearchpeer-review

Tomkiewicz, Pawel ; Winkler, Adolf ; Krzywiecki, M ; Chasse, Thomas ; Szuber, Josef. / Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen. In: Applied Surface Science. 2008 ; Vol. 254. pp. 8035-8040.
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AU - Chasse, Thomas

AU - Szuber, Josef

PY - 2008

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