Analyses and Modeling of a Wet-Chemical-Etch Process on Rotating Silicon Wafers with an Impinging Etchant Jet

Felix Staudegger, Michael Hofbaur, Hans-Jürgen Kruwinus

Institute of Automation and Control (4430)

Research output: Contribution to journal › Article › peer-review

1 results

Finished

Advanced Process Control (APC) for Semiconductor Processing Equipment (II)
Hofbaur, M., Staudegger, F. & Dourdoumas, N.
1/08/05 → 31/07/07
Project: Research project