Analyses and Modeling of a Wet-Chemical-Etch Process on Rotating Silicon Wafers with an Impinging Etchant Jet

Felix Staudegger, Michael Hofbaur, Hans-Jürgen Kruwinus

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)H340-H345
JournalJournal of the Electrochemical Society
Volume156
Issue number5
Publication statusPublished - 2009

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

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