3D Nanoprinting Using Electron and Ion Beams

Precise 3D electron/ion nanoprinting is best achieved by accounting for deposition artifacts during the computer-aided design (CAD) phase. Otherwise, deposition is relegated to a tedious trial-and-error approach to replicate the desired geometry. Empirical corrections can be used to account for deposition errors or artifacts, but such solutions usually apply over a limited range of deposition conditions. Ideally, a general mathematical correction is the best solution because the identification of rate limiting factors related to deposition, such as mass-transport or reaction-rate limitations, leads to a more robust correction method which can be applied over a much larger range of deposition conditions. A comprehensive 3D electron beam nanoprinting capability consisting of experiments, simulations and design will be demonstrated which enables precise 3D nanoprinting. In addition, a mathematical-based scheme will be presented that makes it possible to compensate for heat induced deposit distortions. If left uncorrected, this type of artifact/error prevents CAD replication during deposition when using a typical organometallic precursor for deposition. The compensation strategy will be demonstrated for electron-based nanoprinting using both simulations and experiments. However, the CAD capability that will be presented is also compatiable with the use of an ion beam for deposition. Select applications of functional 3D nanoprinted structures will also be presented.