3D Nanoprinting Using Electron and Ion Beams

Jason D. Fowlkes, Eva Mutunga, Robert Winkler, Jürgen Sattelkow, Grace Pakeltis, P. Rack, Alex Belianinov, Olga S. Ovchinnikova, Harald Plank

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Abstract

Precise 3D electron/ion nanoprinting is best achieved by accounting for deposition artifacts during the computer-aided design (CAD) phase. Otherwise, deposition is relegated to a tedious trial-and-error approach to replicate the desired geometry. Empirical corrections can be used to account for deposition errors or artifacts, but such solutions usually apply over a limited range of deposition conditions. Ideally, a general mathematical correction is the best solution because the identification of rate limiting factors related to deposition, such as mass-transport or reaction-rate limitations, leads to a more robust correction method which can be applied over a much larger range of deposition conditions. A comprehensive 3D electron beam nanoprinting capability consisting of experiments, simulations and design will be demonstrated which enables precise 3D nanoprinting. In addition, a mathematical-based scheme will be presented that makes it possible to compensate for heat induced deposit distortions. If left uncorrected, this type of artifact/error prevents CAD replication during deposition when using a typical organometallic precursor for deposition. The compensation strategy will be demonstrated for electron-based nanoprinting using both simulations and experiments. However, the CAD capability that will be presented is also compatiable with the use of an ion beam for deposition. Select applications of functional 3D nanoprinted structures will also be presented.
Original languageEnglish
Title of host publicationMRS Fall Meeting 2019
ChapterMT 05.10.01
Pages2020
Publication statusPublished - 2019
EventEuropean MRS Fall Meeting 2019 - Warsaw University of Technology, Warsaw, Poland
Duration: 16 Sep 201919 Sep 2019

Conference

ConferenceEuropean MRS Fall Meeting 2019
Abbreviated titleE-MRS Fall Meeting 2019
CountryPoland
CityWarsaw
Period16/09/1919/09/19

ASJC Scopus subject areas

  • Materials Science(all)

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Fowlkes, J. D., Mutunga, E., Winkler, R., Sattelkow, J., Pakeltis, G., Rack, P., ... Plank, H. (2019). 3D Nanoprinting Using Electron and Ion Beams. In MRS Fall Meeting 2019 (pp. 2020)