Preparation and investigation of photoreactive polymers for applications with excimer lasers

The aim of the project is the preparation and investigation of polymers containing photosensitive units, which behave different under Hg-lamp and excimer laser UV irradiation. Materials of this kind have potential interest for applications as laser-specific photoresists. The investigation is focused on polymers which contain benzil or benzylester units in the main chain or as pendant side groups. The polymers are irradiated under monochromatic, continuous Hg-lamp irradiation and under pulsed excimer laser irradiation. The behaviour of the polymers under both light sources is compared. Analytical techniques comprise sol/gel analysis and spectroscopic methods. In order to obtain information about the photoreactions occurring, low-molecular-weight model compounds are also under investigation. and under pulsed