Vapour-phase deposition of oriented copper dicarboxylate metal-organic framework thin films

Timothée Stassin, Sabina Rodríguez-Hermida, Benedikt Schrode, Alexander John Cruz, Francesco Carraro, Dmitry Kravchenko, Vincent Creemers, Ivo Stassen, Tom Hauffman, Dirk De Vos, Paolo Falcaro, Roland Resel, Rob Ameloot

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Abstract

Copper dicarboxylate metal-organic framework films are deposited via chemical vapour deposition. Uniform films of CuBDC and CuCDC with an out-of-plane orientation and accessible porosity are obtained from the reaction of Cu and CuO with vaporised dicarboxylic acid linkers.

Originalspracheenglisch
Seiten (von - bis)10056-10059
Seitenumfang4
FachzeitschriftChemical Communications
Jahrgang55
Ausgabenummer68
DOIs
PublikationsstatusVeröffentlicht - 1 Jan 2019

ASJC Scopus subject areas

  • !!Catalysis
  • !!Electronic, Optical and Magnetic Materials
  • !!Ceramics and Composites
  • !!Chemistry(all)
  • !!Surfaces, Coatings and Films
  • !!Metals and Alloys
  • !!Materials Chemistry

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  • Dieses zitieren

    Stassin, T., Rodríguez-Hermida, S., Schrode, B., Cruz, A. J., Carraro, F., Kravchenko, D., ... Ameloot, R. (2019). Vapour-phase deposition of oriented copper dicarboxylate metal-organic framework thin films. Chemical Communications, 55(68), 10056-10059. https://doi.org/10.1039/c9cc05161a