Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants

Murad Redzheb, Oguzhan Orkut Okudur, Sigrid Bernstorff, Krunoslav Juraic, Pascal Van Der Voort, Silvia Armini

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Abstract

Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.

Originalspracheenglisch
Seiten (von - bis)2295-2298
Seitenumfang4
FachzeitschriftChemPhysChem
Jahrgang19
Ausgabenummer18
DOIs
PublikationsstatusVeröffentlicht - 18 Sep 2018

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Surface-Active Agents
Tuning
surfactants
tuning
impedance measurement
Nanoindentation
nanoindentation
X ray scattering
grazing incidence
ethane
Self assembly
Pore size
self assembly
Evaporation
infrared spectroscopy
evaporation
porosity
Thin films
thin films
scattering

Schlagwörter

    ASJC Scopus subject areas

    • !!Atomic and Molecular Physics, and Optics
    • !!Physical and Theoretical Chemistry

    Dies zitieren

    Redzheb, M., Okudur, O. O., Bernstorff, S., Juraic, K., Van Der Voort, P., & Armini, S. (2018). Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. ChemPhysChem, 19(18), 2295-2298. https://doi.org/10.1002/cphc.201800341

    Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. / Redzheb, Murad; Okudur, Oguzhan Orkut; Bernstorff, Sigrid; Juraic, Krunoslav; Van Der Voort, Pascal; Armini, Silvia.

    in: ChemPhysChem, Jahrgang 19, Nr. 18, 18.09.2018, S. 2295-2298.

    Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

    Redzheb, M, Okudur, OO, Bernstorff, S, Juraic, K, Van Der Voort, P & Armini, S 2018, 'Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants' ChemPhysChem, Jg. 19, Nr. 18, S. 2295-2298. https://doi.org/10.1002/cphc.201800341
    Redzheb M, Okudur OO, Bernstorff S, Juraic K, Van Der Voort P, Armini S. Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. ChemPhysChem. 2018 Sep 18;19(18):2295-2298. https://doi.org/10.1002/cphc.201800341
    Redzheb, Murad ; Okudur, Oguzhan Orkut ; Bernstorff, Sigrid ; Juraic, Krunoslav ; Van Der Voort, Pascal ; Armini, Silvia. / Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. in: ChemPhysChem. 2018 ; Jahrgang 19, Nr. 18. S. 2295-2298.
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