TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization

Werner Grogger, Christian Gspan, Bernhard Schaffer, Martina Dienstleder, Michael Rogers, Albert Brunegger, Ferdinand Hofer

Publikation: Konferenzbeitrag(Altdaten) Vortrag oder PräsentationForschung

Originalspracheenglisch
PublikationsstatusVeröffentlicht - 15 Sep 2005
VeranstaltungCrystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV - Grenoble
Dauer: 15 Sep 200516 Sep 2005

Konferenz

KonferenzCrystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV
OrtGrenoble
Zeitraum15/09/0516/09/05

Dieses zitieren

Grogger, W., Gspan, C., Schaffer, B., Dienstleder, M., Rogers, M., Brunegger, A., & Hofer, F. (2005). TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization. Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV, Grenoble, .