Surface layer destruction during ion beam analysis

R. Behrisch, W. von der Linden, U. von Toussaint, D. Grambole

Publikation: Beitrag in einer FachzeitschriftArtikelBegutachtung

Abstract

In ion beam analysis the decrease of the measuring signal with a number of incident ions, due to a destruction of the surface layer being analysed, depends critically on the lateral intensity distribution in the analysing ion beam. For the assumption of destruction in one step, the decrease was calculated and the obtained analytical formulae was fitted to the decrease as measured in ERDA and PIXE analyses. This allows to obtain values for the destruction cross sections for the ions and the samples in the analysis, as well as information about the lateral intensity distribution in the analysing ion beam.
Originalspracheenglisch
Seiten (von - bis)440-446
Seitenumfang7
FachzeitschriftNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Jahrgang155
Ausgabenummer4
DOIs
PublikationsstatusVeröffentlicht - 1 Sep. 1999

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