Strong-field-induced attosecond dynamics in SiO2

M. Schultze, E. M. Bothschafter, A. Sommer, M. Fiess, R. Kienberger, V. Apalkov, V. S. Yakovlev, M. I. Stockman, F. Krausz

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Abstract

Striking field-induced changes in the absorption near the Si L-edge of SiO2 exposed to a near-infrared laser field of several V/Å delivered by a few-cycle pulse are observed with sub-100 attosecond extreme ultraviolet pulses by means of attosecond transient absorption.
Originalspracheenglisch
Seitenumfang3
FachzeitschriftEPJ Web of Conferences
Jahrgang41
DOIs
PublikationsstatusVeröffentlicht - 2013
Extern publiziertJa

Fields of Expertise

  • Advanced Materials Science

Dies zitieren

Schultze, M., Bothschafter, E. M., Sommer, A., Fiess, M., Kienberger, R., Apalkov, V., ... Krausz, F. (2013). Strong-field-induced attosecond dynamics in SiO2. EPJ Web of Conferences, 41. https://doi.org/10.1051/epjconf/20134102014

Strong-field-induced attosecond dynamics in SiO2. / Schultze, M.; Bothschafter, E. M.; Sommer, A.; Fiess, M.; Kienberger, R.; Apalkov, V.; Yakovlev, V. S.; Stockman, M. I.; Krausz, F.

in: EPJ Web of Conferences, Jahrgang 41, 2013.

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Schultze, M, Bothschafter, EM, Sommer, A, Fiess, M, Kienberger, R, Apalkov, V, Yakovlev, VS, Stockman, MI & Krausz, F 2013, 'Strong-field-induced attosecond dynamics in SiO2' EPJ Web of Conferences, Jg. 41. https://doi.org/10.1051/epjconf/20134102014
Schultze M, Bothschafter EM, Sommer A, Fiess M, Kienberger R, Apalkov V et al. Strong-field-induced attosecond dynamics in SiO2. EPJ Web of Conferences. 2013;41. https://doi.org/10.1051/epjconf/20134102014
Schultze, M. ; Bothschafter, E. M. ; Sommer, A. ; Fiess, M. ; Kienberger, R. ; Apalkov, V. ; Yakovlev, V. S. ; Stockman, M. I. ; Krausz, F. / Strong-field-induced attosecond dynamics in SiO2. in: EPJ Web of Conferences. 2013 ; Jahrgang 41.
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title = "Strong-field-induced attosecond dynamics in SiO2",
abstract = "Striking field-induced changes in the absorption near the Si L-edge of SiO2 exposed to a near-infrared laser field of several V/{\AA} delivered by a few-cycle pulse are observed with sub-100 attosecond extreme ultraviolet pulses by means of attosecond transient absorption.",
author = "M. Schultze and Bothschafter, {E. M.} and A. Sommer and M. Fiess and R. Kienberger and V. Apalkov and Yakovlev, {V. S.} and Stockman, {M. I.} and F. Krausz",
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T1 - Strong-field-induced attosecond dynamics in SiO2

AU - Schultze, M.

AU - Bothschafter, E. M.

AU - Sommer, A.

AU - Fiess, M.

AU - Kienberger, R.

AU - Apalkov, V.

AU - Yakovlev, V. S.

AU - Stockman, M. I.

AU - Krausz, F.

PY - 2013

Y1 - 2013

N2 - Striking field-induced changes in the absorption near the Si L-edge of SiO2 exposed to a near-infrared laser field of several V/Å delivered by a few-cycle pulse are observed with sub-100 attosecond extreme ultraviolet pulses by means of attosecond transient absorption.

AB - Striking field-induced changes in the absorption near the Si L-edge of SiO2 exposed to a near-infrared laser field of several V/Å delivered by a few-cycle pulse are observed with sub-100 attosecond extreme ultraviolet pulses by means of attosecond transient absorption.

U2 - 10.1051/epjconf/20134102014

DO - 10.1051/epjconf/20134102014

M3 - Article

VL - 41

JO - EPJ Web of Conferences

JF - EPJ Web of Conferences

SN - 2100-014X

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