Single-chamber deposition of multilayer barriers by plasma enhanced and initiated chemical vapor deposition of organosilicones

Material Science

• Chemical Vapor Deposition 100%
• Polymers 66%
• Coating 33%
• Adhesion 33%
• Film 33%
• Surface Roughness 33%
• Ion Implantation 33%
• Polymerization 33%
• Water Vapor 33%

Engineering

• Depleted Layer 33%
• Improvement Factor 33%
• Polymer Substrate 33%
• Assisted Deposition 33%