Reductive photopatterning of phenylene-vinylene-based polymers

T. Kavc; Gregor Langer; Wolfgang Kern; Andreas Ruplitsch; Arnulf-Kai Mahler; Franz Stelzer; Gertraud Hayn; Robert Saf; Emil List; Egbert Zojer; M.T. Ahmed; Alexander Pogantsch; Kurt Friedrich Iskra; Theo Neger; H. H. Hörhold; H. Tillmann; G. Kanzelbinder; E. Toussaere; G. Jakopic

Reductive photopatterning of phenylene-vinylene-based polymers

T. Kavc, Gregor Langer, Wolfgang Kern, Andreas Ruplitsch, Arnulf-Kai Mahler, Franz Stelzer, Gertraud Hayn, Robert Saf, Emil List, Egbert Zojer, M.T. Ahmed, Alexander Pogantsch, Kurt Friedrich Iskra, Theo Neger, H. H. Hörhold, H. Tillmann, G. Kanzelbinder, E. Toussaere, G. Jakopic

Publikation: Beitrag in einer Fachzeitschrift › Artikel

Originalsprache	englisch
Seiten (von - bis)	BB11.3.1.-BB11.3.1.
Fachzeitschrift	Materials Research Society Symposium Proceedings
Jahrgang	708
Publikationsstatus	Veröffentlicht - 2002

Dieses zitieren

Kavc, T., Langer, G., Kern, W., Ruplitsch, A., Mahler, A-K., Stelzer, F., Hayn, G., Saf, R., List, E., Zojer, E., Ahmed, M. T., Pogantsch, A., Iskra, K. F., Neger, T., Hörhold, H. H., Tillmann, H., Kanzelbinder, G., Toussaere, E., & Jakopic, G. (2002). Reductive photopatterning of phenylene-vinylene-based polymers. Materials Research Society Symposium Proceedings, 708, BB11.3.1.-BB11.3.1.

Kavc, T, Langer, G, Kern, W , Ruplitsch, A, Mahler, A-K, Stelzer, F, Hayn, G, Saf, R, List, E, Zojer, E, Ahmed, MT, Pogantsch, A, Iskra, KF, Neger, T, Hörhold, HH, Tillmann, H, Kanzelbinder, G, Toussaere, E & Jakopic, G 2002, 'Reductive photopatterning of phenylene-vinylene-based polymers', Materials Research Society Symposium Proceedings, Jg. 708, S. BB11.3.1.-BB11.3.1.

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title = "Reductive photopatterning of phenylene-vinylene-based polymers",

author = "T. Kavc and Gregor Langer and Wolfgang Kern and Andreas Ruplitsch and Arnulf-Kai Mahler and Franz Stelzer and Gertraud Hayn and Robert Saf and Emil List and Egbert Zojer and M.T. Ahmed and Alexander Pogantsch and Iskra, {Kurt Friedrich} and Theo Neger and H{\"o}rhold, {H. H.} and H. Tillmann and G. Kanzelbinder and E. Toussaere and G. Jakopic",

year = "2002",

language = "English",

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pages = "BB11.3.1.--BB11.3.1.",

journal = "Materials Research Society Symposium Proceedings",

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TY - JOUR

T1 - Reductive photopatterning of phenylene-vinylene-based polymers

AU - Kavc, T.

AU - Langer, Gregor

AU - Kern, Wolfgang

AU - Ruplitsch, Andreas

AU - Mahler, Arnulf-Kai

AU - Stelzer, Franz

AU - Hayn, Gertraud

AU - Saf, Robert

AU - List, Emil

AU - Zojer, Egbert

AU - Ahmed, M.T.

AU - Pogantsch, Alexander

AU - Iskra, Kurt Friedrich

AU - Neger, Theo

AU - Hörhold, H. H.

AU - Tillmann, H.

AU - Kanzelbinder, G.

AU - Toussaere, E.

AU - Jakopic, G.

PY - 2002

Y1 - 2002

M3 - Article

SN - 1946-4274

VL - 708

SP - BB11.3.1.-BB11.3.1.

JO - Materials Research Society Symposium Proceedings

JF - Materials Research Society Symposium Proceedings

ER -