Photoresists Based on Coconut and Castor Oil

Klaus Peter Luef; Charlotte Petit; Bruno Grassl; Stéphanie Reynaud; Frank Wiesbrock

Photoresists Based on Coconut and Castor Oil

Klaus Peter Luef, Charlotte Petit, Bruno Grassl, Stéphanie Reynaud, Frank Wiesbrock

Institut für Chemische Technologie von Materialien (6380)

Publikation: Konferenzbeitrag › (Altdaten) Vortrag oder Präsentation

Originalsprache	englisch
Publikationsstatus	Veröffentlicht - 21 Aug. 2016
Veranstaltung	252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia - Philadelphia, USA / Vereinigte Staaten Dauer: 21 Aug. 2016 → 25 Aug. 2016

Konferenz

Konferenz	252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia
Land/Gebiet	USA / Vereinigte Staaten
Ort	Philadelphia
Zeitraum	21/08/16 → 25/08/16

Fields of Expertise

Advanced Materials Science

Kooperationen

NAWI Graz

Dieses zitieren

@conference{ee8fa90ab2134e0194145ab1d89ce269,

title = "Photoresists Based on Coconut and Castor Oil",

author = "Luef, {Klaus Peter} and Charlotte Petit and Bruno Grassl and St{\'e}phanie Reynaud and Frank Wiesbrock",

year = "2016",

month = aug,

day = "21",

language = "English",

note = "252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia ; Conference date: 21-08-2016 Through 25-08-2016",

}

TY - CONF

T1 - Photoresists Based on Coconut and Castor Oil

AU - Luef, Klaus Peter

AU - Petit, Charlotte

AU - Grassl, Bruno

AU - Reynaud, Stéphanie

AU - Wiesbrock, Frank

PY - 2016/8/21

Y1 - 2016/8/21

M3 - (Old data) Lecture or Presentation

T2 - 252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia

Y2 - 21 August 2016 through 25 August 2016

ER -