New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex; Peter Pacher; Robert Schennach; Q. Shen; Gregor Hlawacek; Christian Teichert; Oliver Werzer; Roland Resel; Egbert Zojer; Wolfgang Kern; Gregor Trimmel

New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex, Peter Pacher, Robert Schennach, Q. Shen, Gregor Hlawacek, Christian Teichert, Oliver Werzer, Roland Resel, Egbert Zojer, Wolfgang Kern, Gregor Trimmel

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband

Originalsprache	englisch
Titel	Scientific Programme: NFN Winter School
Herausgeber (Verlag)	.
Seiten	52-52
Publikationsstatus	Veröffentlicht - 2007

Dieses zitieren

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title = "New photosensitive silane molecule for photochemical patterning of thin layers",

author = "Alexandra Lex and Peter Pacher and Robert Schennach and Q. Shen and Gregor Hlawacek and Christian Teichert and Oliver Werzer and Roland Resel and Egbert Zojer and Wolfgang Kern and Gregor Trimmel",

year = "2007",

language = "English",

pages = "52--52",

booktitle = "Scientific Programme: NFN Winter School",

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TY - GEN

T1 - New photosensitive silane molecule for photochemical patterning of thin layers

AU - Lex, Alexandra

AU - Pacher, Peter

AU - Schennach, Robert

AU - Shen, Q.

AU - Hlawacek, Gregor

AU - Teichert, Christian

AU - Werzer, Oliver

AU - Resel, Roland

AU - Zojer, Egbert

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Conference paper

SP - 52

EP - 52

BT - Scientific Programme: NFN Winter School

PB - .

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