Modeling the Growth of Tin Dioxide using Spray Pyrolysis Deposition for Gas Sensor Applications

Lado Filipovic; Siegfried Selberherr; Giorgio Cataldo Mutinati; Elise Brunet; Stephan Steinhauer; Anton Köck; Jordi Teva; Jochen Kraft; Jörg Siegert; Franz Schrank; Christian Gspan; Werner Grogger

doi:10.1109/TSM.2014.2298883

Modeling the Growth of Tin Dioxide using Spray Pyrolysis Deposition for Gas Sensor Applications

Lado Filipovic, Siegfried Selberherr, Giorgio Cataldo Mutinati, Elise Brunet, Stephan Steinhauer, Anton Köck, Jordi Teva, Jochen Kraft, Jörg Siegert, Franz Schrank, Christian Gspan, Werner Grogger

Institut für Elektronenmikroskopie und Nanoanalytik (5190)

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	269-277
Fachzeitschrift	IEEE Transactions on Semiconductor Manufacturing
Jahrgang	27
Ausgabenummer	2
DOIs	https://doi.org/10.1109/TSM.2014.2298883
Publikationsstatus	Veröffentlicht - 2014

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Zugriff auf Dokument

10.1109/TSM.2014.2298883

Dieses zitieren

Filipovic, L., Selberherr, S., Mutinati, G. C., Brunet, E., Steinhauer, S., Köck, A., Teva, J., Kraft, J., Siegert, J., Schrank, F., Gspan, C., & Grogger, W. (2014). Modeling the Growth of Tin Dioxide using Spray Pyrolysis Deposition for Gas Sensor Applications. IEEE Transactions on Semiconductor Manufacturing , 27(2), 269-277. https://doi.org/10.1109/TSM.2014.2298883

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AU - Filipovic, Lado

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AU - Brunet, Elise

AU - Steinhauer, Stephan

AU - Köck, Anton

AU - Teva, Jordi

AU - Kraft, Jochen

AU - Siegert, Jörg

AU - Schrank, Franz

AU - Gspan, Christian

AU - Grogger, Werner

PY - 2014

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DO - 10.1109/TSM.2014.2298883

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EP - 277

JO - IEEE Transactions on Semiconductor Manufacturing

JF - IEEE Transactions on Semiconductor Manufacturing

SN - 0894-6507

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