Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition

Lado Filipovic; Siegfried Selberherr; Giorgio Cataldo Mutinati; Elise Brunet; Stephan Steinhauer; Anton Köck; Jordi Teva; Jochen Kraft; Jörg Siegert; Franz Schrank; Christian Gspan; Werner Grogger

doi:10.1109/SISPAD.2013.6650611

Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition

Lado Filipovic, Siegfried Selberherr, Giorgio Cataldo Mutinati, Elise Brunet, Stephan Steinhauer, Anton Köck, Jordi Teva, Jochen Kraft, Jörg Siegert, Franz Schrank, Christian Gspan, Werner Grogger

Institut für Elektronenmikroskopie und Nanoanalytik (5190)

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband › Begutachtung

Originalsprache	englisch
Titel	Simulation of Semiconductor Processes and Devices
Erscheinungsort	Piscataway, NJ
Herausgeber (Verlag)	Institute of Electrical and Electronics Engineers
Seiten	208-211
ISBN (Print)	978-1-4673-5736-4
DOIs	https://doi.org/10.1109/SISPAD.2013.6650611
Publikationsstatus	Veröffentlicht - 2013
Veranstaltung	International Conference on Simulation of Semiconductor Processes and Devices - Glasgow, Großbritannien / Vereinigtes Königreich Dauer: 3 Sept. 2013 → 5 Sept. 2013

Konferenz

Konferenz	International Conference on Simulation of Semiconductor Processes and Devices
Land/Gebiet	Großbritannien / Vereinigtes Königreich
Ort	Glasgow
Zeitraum	3/09/13 → 5/09/13

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Zugriff auf Dokument

10.1109/SISPAD.2013.6650611

Dieses zitieren

Filipovic, L., Selberherr, S., Mutinati, G. C., Brunet, E., Steinhauer, S., Köck, A., Teva, J., Kraft, J., Siegert, J., Schrank, F., Gspan, C., & Grogger, W. (2013). Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. in Simulation of Semiconductor Processes and Devices (S. 208-211). Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/SISPAD.2013.6650611

Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. / Filipovic, Lado; Selberherr, Siegfried; Mutinati, Giorgio Cataldo et al.
Simulation of Semiconductor Processes and Devices. Piscataway, NJ: Institute of Electrical and Electronics Engineers, 2013. S. 208-211.

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband › Begutachtung

Filipovic, L, Selberherr, S, Mutinati, GC, Brunet, E, Steinhauer, S, Köck, A, Teva, J, Kraft, J, Siegert, J, Schrank, F, Gspan, C & Grogger, W 2013, Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. in Simulation of Semiconductor Processes and Devices. Institute of Electrical and Electronics Engineers, Piscataway, NJ, S. 208-211, International Conference on Simulation of Semiconductor Processes and Devices, Glasgow, Großbritannien / Vereinigtes Königreich, 3/09/13. https://doi.org/10.1109/SISPAD.2013.6650611

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AU - Filipovic, Lado

AU - Selberherr, Siegfried

AU - Mutinati, Giorgio Cataldo

AU - Brunet, Elise

AU - Steinhauer, Stephan

AU - Köck, Anton

AU - Teva, Jordi

AU - Kraft, Jochen

AU - Siegert, Jörg

AU - Schrank, Franz

AU - Gspan, Christian

AU - Grogger, Werner

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BT - Simulation of Semiconductor Processes and Devices

PB - Institute of Electrical and Electronics Engineers

CY - Piscataway, NJ

T2 - International Conference on Simulation of Semiconductor Processes and Devices

Y2 - 3 September 2013 through 5 September 2013

ER -