Investigation of Epitaxial Process Induced Stacking Faults on Silicon Wafers by Surface Analytical Methods

Ernst Lankmayr, Brigitte Patsch, T. Ehmann

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	H540-H544
Fachzeitschrift	Journal of the Electrochemical Society
Jahrgang	155 (7)
DOIs	https://doi.org/10.1149/1.2919104
Publikationsstatus	Veröffentlicht - 2008

Treatment code (Nähere Zuordnung)

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title = "Investigation of Epitaxial Process Induced Stacking Faults on Silicon Wafers by Surface Analytical Methods",

author = "Ernst Lankmayr and Brigitte Patsch and T. Ehmann",

year = "2008",

doi = "10.1149/1.2919104",

language = "English",

volume = "155 (7)",

pages = "H540--H544",

journal = "Journal of the Electrochemical Society",

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TY - JOUR

T1 - Investigation of Epitaxial Process Induced Stacking Faults on Silicon Wafers by Surface Analytical Methods

AU - Lankmayr, Ernst

AU - Patsch, Brigitte

AU - Ehmann, T.

PY - 2008

Y1 - 2008

U2 - 10.1149/1.2919104

DO - 10.1149/1.2919104

M3 - Article

VL - 155 (7)

SP - H540-H544

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

ER -