Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle.

Rudolf Stollberger, Paul Wach, Ch. Leussler, E. Justich

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Originalspracheenglisch
TitelProc. SMRM (Works in Progress), 8th Meeting
Herausgeber (Verlag).
Seiten1165-1165
PublikationsstatusVeröffentlicht - 1989

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Dies zitieren

Stollberger, R., Wach, P., Leussler, C., & Justich, E. (1989). Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. in Proc. SMRM (Works in Progress), 8th Meeting (S. 1165-1165). ..

Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. / Stollberger, Rudolf; Wach, Paul; Leussler, Ch.; Justich, E.

Proc. SMRM (Works in Progress), 8th Meeting. ., 1989. S. 1165-1165.

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Stollberger, R, Wach, P, Leussler, C & Justich, E 1989, Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. in Proc. SMRM (Works in Progress), 8th Meeting. ., S. 1165-1165.
Stollberger R, Wach P, Leussler C, Justich E. Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. in Proc. SMRM (Works in Progress), 8th Meeting. . 1989. S. 1165-1165
Stollberger, Rudolf ; Wach, Paul ; Leussler, Ch. ; Justich, E. / Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. Proc. SMRM (Works in Progress), 8th Meeting. ., 1989. S. 1165-1165
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Y1 - 1989

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