Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle

Rudolf Stollberger; Paul Wach; C. Leussler; E. Justich

Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle

Rudolf Stollberger, Paul Wach, C. Leussler, E. Justich

Institute of Biomedical Imaging (7170)

Publikation: Konferenzbeitrag › Poster

Originalsprache	englisch
Publikationsstatus	Veröffentlicht - 1989
Veranstaltung	8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine: SMRM 1989 - Amsterdam, Niederlande Dauer: 12 Aug. 1989 → 18 Aug. 1989

Konferenz

Konferenz	8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine
Land/Gebiet	Niederlande
Ort	Amsterdam
Zeitraum	12/08/89 → 18/08/89

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Dieses zitieren

@conference{054d8c49bab74ee2bb9287bcaa412015,

title = "Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle",

author = "Rudolf Stollberger and Paul Wach and C. Leussler and E. Justich",

year = "1989",

language = "English",

note = "8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine : SMRM 1989 ; Conference date: 12-08-1989 Through 18-08-1989",

}

TY - CONF

T1 - Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle

AU - Stollberger, Rudolf

AU - Wach, Paul

AU - Leussler, C.

AU - Justich, E.

PY - 1989

Y1 - 1989

M3 - Poster

T2 - 8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine

Y2 - 12 August 1989 through 18 August 1989

ER -