Initial steps of rubicene film growth on silicon dioxide

Boris Renato Scherwitzl, Walter Lukesch, Andreas Hirzer, Jörg Albering, Günther Leising, Roland Resel, Adolf Winkler

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Originalspracheenglisch
Seiten (von - bis)4115-4123
FachzeitschriftThe journal of physical chemistry (Washington, DC) / C
Jahrgang117
PublikationsstatusVeröffentlicht - 2013

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

Dies zitieren

Initial steps of rubicene film growth on silicon dioxide. / Scherwitzl, Boris Renato; Lukesch, Walter; Hirzer, Andreas; Albering, Jörg; Leising, Günther; Resel, Roland; Winkler, Adolf.

in: The journal of physical chemistry (Washington, DC) / C, Jahrgang 117, 2013, S. 4115-4123.

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

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journal = "The journal of physical chemistry (Washington, DC) / C",
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T1 - Initial steps of rubicene film growth on silicon dioxide

AU - Scherwitzl, Boris Renato

AU - Lukesch, Walter

AU - Hirzer, Andreas

AU - Albering, Jörg

AU - Leising, Günther

AU - Resel, Roland

AU - Winkler, Adolf

PY - 2013

Y1 - 2013

M3 - Article

VL - 117

SP - 4115

EP - 4123

JO - The journal of physical chemistry (Washington, DC) / C

JF - The journal of physical chemistry (Washington, DC) / C

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