Hierarchy of adhesion forces in patterns of photoreactive surface layers

Gregor Hlawacek, Quan Shen, Christian Teichert, Alexandra Lex, Gregor Trimmel, Wolfgang Kern

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	deutsch
Seiten (von - bis)	044703/1-044703/5
Fachzeitschrift	The Journal of Chemical Physics
Jahrgang	130
DOIs	https://doi.org/10.1063/1.3062841
Publikationsstatus	Veröffentlicht - 2009

Treatment code (Nähere Zuordnung)

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title = "Hierarchy of adhesion forces in patterns of photoreactive surface layers",

author = "Gregor Hlawacek and Quan Shen and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",

year = "2009",

doi = "10.1063/1.3062841",

language = "deutsch",

volume = "130",

pages = "044703/1--044703/5",

journal = "The Journal of Chemical Physics",

issn = "1089-7690",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Hierarchy of adhesion forces in patterns of photoreactive surface layers

AU - Hlawacek, Gregor

AU - Shen, Quan

AU - Teichert, Christian

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

PY - 2009

Y1 - 2009

U2 - 10.1063/1.3062841

DO - 10.1063/1.3062841

M3 - Artikel

SN - 1089-7690

VL - 130

SP - 044703/1-044703/5

JO - The Journal of Chemical Physics

JF - The Journal of Chemical Physics

ER -