Abstract
Deep X-ray lithography combined with sol-gel techniques offers facile fabrication of controlled patterned films. Using sol-gel, different functional properties can be induced; deep X-ray lithography alters the functionality in the exposed regions. Miniaturized devices based on local property changes are easily fabricated: this technique requires no resist, enabling direct patterning of films in a one-step lithographic process. (Figure Presented).
Originalsprache | englisch |
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Seiten (von - bis) | 4932-4936 |
Seitenumfang | 5 |
Fachzeitschrift | Advanced Materials |
Jahrgang | 21 |
Ausgabenummer | 48 |
DOIs | |
Publikationsstatus | Veröffentlicht - 28 Dez. 2009 |
Extern publiziert | Ja |
ASJC Scopus subject areas
- Werkstoffwissenschaften (insg.)
- Werkstoffmechanik
- Maschinenbau