Evolution of microstructure and mechanical properties of a graded TiAlON thin film investigated by cross-sectional characterization techniques

Nina Schalk*, Michael Tkadletz, Velislava L. Terziyska, Marco Deluca, Ilse Letofsky-Papst, Jozef Keckes, Christian Mitterer

*Korrespondierende/r Autor/-in für diese Arbeit

Publikation: Beitrag in einer FachzeitschriftArtikelBegutachtung

Abstract

In the last years, quaternary oxynitrides have emerged as a new class of materials due to their tunable properties. Within the present work, a graded TiAl(O)N film was grown by magnetron sputter deposition, using TiAl targets with a Ti/Al atomic ratio of 40/60, constant nitrogen and stepwise increasing oxygen partial pressure over the film thickness. The microstructural evolution of the film was investigated by transmission electron microscopy and synchrotron X-ray nanodiffraction. Complementary, cross-sectional μ-Raman spectroscopy was performed to further validate the phase evolution. The first layer, grown without the addition of oxygen, showed a prevalent wurtzite (w) structure and a subordinate face centered cubic (fcc) phase fraction. The addition of small amounts of oxygen resulted in the stabilization of the fcc-phase and the w-phase vanished. With increasing film thickness and thus, increasing oxygen content, increasing amounts of an additional amorphous phase fraction were observed. In the first layers, tensile in-plain strain was determined, which turns to compressive towards the film surface. Cross-sectional nanonindentation revealed increasing hardness and elastic modulus with increasing oxygen content in the first layers as a result of the w to fcc transition; however, towards the film surface the hardness decreases, which can be related to the increasing amorphous phase fraction.

Originalspracheenglisch
Seiten (von - bis)155-161
Seitenumfang7
FachzeitschriftSurface and Coatings Technology
Jahrgang359
DOIs
PublikationsstatusVeröffentlicht - 15 Feb. 2019

ASJC Scopus subject areas

  • Chemie (insg.)
  • Physik der kondensierten Materie
  • Oberflächen und Grenzflächen
  • Oberflächen, Beschichtungen und Folien
  • Werkstoffchemie

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