Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm

Wolfgang Ernst, C. Pollock, F. K. Tittel

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Originalspracheenglisch
TitelTopical meeting on excimer lasers
ErscheinungsortNew York
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers
SeitenTU-A10/1-4-TU-A10/1-4
PublikationsstatusVeröffentlicht - 1979

Dies zitieren

Ernst, W., Pollock, C., & Tittel, F. K. (1979). Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. in Topical meeting on excimer lasers (S. TU-A10/1-4-TU-A10/1-4). New York: Institute of Electrical and Electronics Engineers.

Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. / Ernst, Wolfgang; Pollock, C.; Tittel, F. K.

Topical meeting on excimer lasers. New York : Institute of Electrical and Electronics Engineers, 1979. S. TU-A10/1-4-TU-A10/1-4.

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Ernst, W, Pollock, C & Tittel, FK 1979, Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. in Topical meeting on excimer lasers. Institute of Electrical and Electronics Engineers, New York, S. TU-A10/1-4-TU-A10/1-4.
Ernst W, Pollock C, Tittel FK. Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. in Topical meeting on excimer lasers. New York: Institute of Electrical and Electronics Engineers. 1979. S. TU-A10/1-4-TU-A10/1-4
Ernst, Wolfgang ; Pollock, C. ; Tittel, F. K. / Electron-Beam Pumped XeF Laser Studies at 351 and 488 nm. Topical meeting on excimer lasers. New York : Institute of Electrical and Electronics Engineers, 1979. S. TU-A10/1-4-TU-A10/1-4
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AU - Pollock, C.

AU - Tittel, F. K.

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M3 - Conference contribution

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BT - Topical meeting on excimer lasers

PB - Institute of Electrical and Electronics Engineers

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