Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

Min Tu, Benzheng Xia, Dmitry E Kravchenko, Max Lutz Tietze, Alexander John Cruz, Ivo Stassen, Tom Hauffman, Joan Teyssandier, Steven De Feyter, Zheng Wang, Roland A Fischer, Benedetta Marmiroli, Heinz Amenitsch, Ana Torvisco Gomez, Miriam Velasquez Hernandez, Paolo Falcaro, Rob Ameloot*

*Korrespondierende/r Autor/-in für diese Arbeit

Publikation: Beitrag in einer FachzeitschriftArtikelBegutachtung

Abstract

Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.

Originalspracheenglisch
Seiten (von - bis)93-99
Seitenumfang7
FachzeitschriftNature Materials
Jahrgang20
Ausgabenummer1
DOIs
PublikationsstatusVeröffentlicht - Jan. 2021

ASJC Scopus subject areas

  • Physik der kondensierten Materie
  • Werkstoffmechanik
  • Maschinenbau
  • Chemie (insg.)
  • Werkstoffwissenschaften (insg.)

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