Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer

S. Schaltin, L. D´UZrzo, Q. Zhao, Harald Plank, Gerald Kothleitner, Christian Gspan, K. Binnemans, J. Fransaer

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Originalspracheenglisch
Seiten (von - bis)13624-13629
FachzeitschriftPhysical chemistry, chemical physics
Jahrgang14
Ausgabenummer39
DOIs
PublikationsstatusVeröffentlicht - 2012

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Dies zitieren

Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer. / Schaltin, S.; D´UZrzo, L.; Zhao, Q.; Plank, Harald; Kothleitner, Gerald; Gspan, Christian; Binnemans, K.; Fransaer, J.

in: Physical chemistry, chemical physics, Jahrgang 14, Nr. 39, 2012, S. 13624-13629.

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Schaltin, S. ; D´UZrzo, L. ; Zhao, Q. ; Plank, Harald ; Kothleitner, Gerald ; Gspan, Christian ; Binnemans, K. ; Fransaer, J. / Direct electroplating of copper on tantalum from ionic liquids in high vacuum: Origin of the tantalum oxide layer. in: Physical chemistry, chemical physics. 2012 ; Jahrgang 14, Nr. 39. S. 13624-13629.
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author = "S. Schaltin and L. D´UZrzo and Q. Zhao and Harald Plank and Gerald Kothleitner and Christian Gspan and K. Binnemans and J. Fransaer",
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AU - Schaltin, S.

AU - D´UZrzo, L.

AU - Zhao, Q.

AU - Plank, Harald

AU - Kothleitner, Gerald

AU - Gspan, Christian

AU - Binnemans, K.

AU - Fransaer, J.

PY - 2012

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U2 - 10.1039/c2cp41786c

DO - 10.1039/c2cp41786c

M3 - Article

VL - 14

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EP - 13629

JO - Physical chemistry, chemical physics

JF - Physical chemistry, chemical physics

SN - 1463-9076

IS - 39

ER -