Deposition kinetics and characterization of stable ionomers from hexamethyldisiloxane and methacrylic acid by plasma enhanced chemical vapor deposition

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Originalspracheenglisch
FachzeitschriftJournal of Applied Physics
Jahrgang119
DOIs
PublikationsstatusVeröffentlicht - 6 Apr 2016

Dies zitieren

@article{1e851dd9451d4b23a84825008aba2a08,
title = "Deposition kinetics and characterization of stable ionomers from hexamethyldisiloxane and methacrylic acid by plasma enhanced chemical vapor deposition",
author = "Urst{\"o}ger, {Georg Johann} and Roland Resel and Georg Koller and Coclite, {Anna Maria}",
year = "2016",
month = "4",
day = "6",
doi = "10.1063/1.4945578",
language = "English",
volume = "119",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Deposition kinetics and characterization of stable ionomers from hexamethyldisiloxane and methacrylic acid by plasma enhanced chemical vapor deposition

AU - Urstöger, Georg Johann

AU - Resel, Roland

AU - Koller, Georg

AU - Coclite, Anna Maria

PY - 2016/4/6

Y1 - 2016/4/6

U2 - 10.1063/1.4945578

DO - 10.1063/1.4945578

M3 - Article

VL - 119

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

ER -