Deep X-ray lithography for direct patterning of PECVD films

Stefano Costacurta, Luca Malfatti, Alessandro Patelli, Paolo Falcaro, Heinz Amenitsch, Benedetta Marmiroli, Gianluca Grenci, Massimo Piccinini, Plinio Innocenzi

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Abstract

An advanced lithographic technique which is based on direct writing of thin films by hard X-rays has been developed. Silica hybrid organic-inorganic films have been deposited by radio frequency plasma-enhanced chemical vapour deposition and have been patterned using deep X-ray lithography with synchrotron light. The exposure to high energy photons removed the organic groups in the films and induced densification of the silica network. The films, after lithographic writing, can be easily chemically etched to obtain well-defined patterns of high quality. By tuning the exposure dose it is possible modulating the structure and the properties of the final material. The overall lithography process can be achieved in two steps, writing by X-rays and chemical etching, therefore employing the hybrid film directly as resist without employing any other intermediate step. The films and the patterned structures have been characterized by ellipsometric spectroscopy, scanning electron microscopy, atomic force microscopy, contact angle measurements, Fourier transform infrared spectroscopy, infrared imaging and Rutherford backscattering. (Figure Presented)

Originalspracheenglisch
Seiten (von - bis)459-465
Seitenumfang7
FachzeitschriftPlasma processes and polymers
Jahrgang7
Ausgabenummer6
DOIs
PublikationsstatusVeröffentlicht - 22 Jun 2010
Extern publiziertJa

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X ray lithography
Plasma enhanced chemical vapor deposition
lithography
x rays
Silicon Dioxide
Silica
silicon dioxide
X rays
Rutherford backscattering spectroscopy
Infrared imaging
Angle measurement
densification
Synchrotrons
Densification
Lithography
Contact angle
Fourier transform infrared spectroscopy
Etching
Atomic force microscopy
backscattering

Schlagwörter

    ASJC Scopus subject areas

    • !!Condensed Matter Physics
    • !!Polymers and Plastics

    Dies zitieren

    Deep X-ray lithography for direct patterning of PECVD films. / Costacurta, Stefano; Malfatti, Luca; Patelli, Alessandro; Falcaro, Paolo; Amenitsch, Heinz; Marmiroli, Benedetta; Grenci, Gianluca; Piccinini, Massimo; Innocenzi, Plinio.

    in: Plasma processes and polymers, Jahrgang 7, Nr. 6, 22.06.2010, S. 459-465.

    Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

    Costacurta, S, Malfatti, L, Patelli, A, Falcaro, P, Amenitsch, H, Marmiroli, B, Grenci, G, Piccinini, M & Innocenzi, P 2010, 'Deep X-ray lithography for direct patterning of PECVD films' Plasma processes and polymers, Jg. 7, Nr. 6, S. 459-465. https://doi.org/10.1002/ppap.200900147
    Costacurta, Stefano ; Malfatti, Luca ; Patelli, Alessandro ; Falcaro, Paolo ; Amenitsch, Heinz ; Marmiroli, Benedetta ; Grenci, Gianluca ; Piccinini, Massimo ; Innocenzi, Plinio. / Deep X-ray lithography for direct patterning of PECVD films. in: Plasma processes and polymers. 2010 ; Jahrgang 7, Nr. 6. S. 459-465.
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    AU - Marmiroli, Benedetta

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