Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer

Harald Etschmaier, Peter Pacher, Alexandra Lex, Gregor Trimmel, Christian Slugovc, Egbert Zojer

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	43-48
Fachzeitschrift	Applied Physics A: Materials Science and Processing
Jahrgang	95
Publikationsstatus	Veröffentlicht - 2009

Treatment code (Nähere Zuordnung)

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title = "Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer",

author = "Harald Etschmaier and Peter Pacher and Alexandra Lex and Gregor Trimmel and Christian Slugovc and Egbert Zojer",

year = "2009",

language = "English",

volume = "95",

pages = "43--48",

journal = "Applied Physics A: Materials Science and Processing",

issn = "1432-0630 ",

publisher = "Springer Heidelberg",

}

TY - JOUR

T1 - Continuous tuning of the threshold voltage of organic thin film transistors by a chemically reactive interfacial layer

AU - Etschmaier, Harald

AU - Pacher, Peter

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Slugovc, Christian

AU - Zojer, Egbert

PY - 2009

Y1 - 2009

M3 - Article

SN - 1432-0630

VL - 95

SP - 43

EP - 48

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

ER -