Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

Alexandra Lex, Peter Pacher, Susanne Temmel, Quan Shen, Gregor Hlawacek, Oliver Werzer, Anna Maria Track, Paul Frank, Veronika Proschek, Robert Schennach, Georg Koller, Michael Ramsey, Christian Teichert, Roland Resel, Adolf Winkler, Egbert Zojer, Wolfgang Kern, Gregor Trimmel

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Originalspracheenglisch
TitelMaterials Research Society Fall Meeting
Herausgeber (Verlag).
Seiten231-231
PublikationsstatusVeröffentlicht - 2007
VeranstaltungMaterials Research Society Fall Meeting - Boston, USA / Vereinigte Staaten
Dauer: 26 Nov 200730 Nov 2007

Konferenz

KonferenzMaterials Research Society Fall Meeting
LandUSA / Vereinigte Staaten
OrtBoston
Zeitraum26/11/0730/11/07

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

Dies zitieren

Lex, A., Pacher, P., Temmel, S., Shen, Q., Hlawacek, G., Werzer, O., ... Trimmel, G. (2007). Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. in Materials Research Society Fall Meeting (S. 231-231). ..

Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. / Lex, Alexandra; Pacher, Peter; Temmel, Susanne; Shen, Quan; Hlawacek, Gregor; Werzer, Oliver; Track, Anna Maria; Frank, Paul; Proschek, Veronika; Schennach, Robert; Koller, Georg; Ramsey, Michael; Teichert, Christian; Resel, Roland; Winkler, Adolf; Zojer, Egbert; Kern, Wolfgang; Trimmel, Gregor.

Materials Research Society Fall Meeting. ., 2007. S. 231-231.

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandForschungBegutachtung

Lex, A, Pacher, P, Temmel, S, Shen, Q, Hlawacek, G, Werzer, O, Track, AM, Frank, P, Proschek, V, Schennach, R, Koller, G, Ramsey, M, Teichert, C, Resel, R, Winkler, A, Zojer, E, Kern, W & Trimmel, G 2007, Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. in Materials Research Society Fall Meeting. ., S. 231-231, Boston, USA / Vereinigte Staaten, 26/11/07.
Lex A, Pacher P, Temmel S, Shen Q, Hlawacek G, Werzer O et al. Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. in Materials Research Society Fall Meeting. . 2007. S. 231-231
Lex, Alexandra ; Pacher, Peter ; Temmel, Susanne ; Shen, Quan ; Hlawacek, Gregor ; Werzer, Oliver ; Track, Anna Maria ; Frank, Paul ; Proschek, Veronika ; Schennach, Robert ; Koller, Georg ; Ramsey, Michael ; Teichert, Christian ; Resel, Roland ; Winkler, Adolf ; Zojer, Egbert ; Kern, Wolfgang ; Trimmel, Gregor. / Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. Materials Research Society Fall Meeting. ., 2007. S. 231-231
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title = "Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces",
author = "Alexandra Lex and Peter Pacher and Susanne Temmel and Quan Shen and Gregor Hlawacek and Oliver Werzer and Track, {Anna Maria} and Paul Frank and Veronika Proschek and Robert Schennach and Georg Koller and Michael Ramsey and Christian Teichert and Roland Resel and Adolf Winkler and Egbert Zojer and Wolfgang Kern and Gregor Trimmel",
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AU - Lex, Alexandra

AU - Pacher, Peter

AU - Temmel, Susanne

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Werzer, Oliver

AU - Track, Anna Maria

AU - Frank, Paul

AU - Proschek, Veronika

AU - Schennach, Robert

AU - Koller, Georg

AU - Ramsey, Michael

AU - Teichert, Christian

AU - Resel, Roland

AU - Winkler, Adolf

AU - Zojer, Egbert

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Conference contribution

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EP - 231

BT - Materials Research Society Fall Meeting

PB - .

ER -