Chemical vapour deposition of zeolitic imidazolate framework thin films

Ivo Stassen, Mark Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe Vereecken, Rob Ameloot

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Abstract

Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.

Originalspracheenglisch
Seiten (von - bis)304-310
Seitenumfang7
FachzeitschriftNature Materials
Jahrgang15
Ausgabenummer3
DOIs
PublikationsstatusVeröffentlicht - 1 Mär 2016
Extern publiziertJa

Fingerprint

Chemical vapor deposition
Metals
vapor deposition
Thin films
thin films
metals
microelectronics
Microelectronics
routes
Microporous materials
Crystalline materials
research facilities
nanofabrication
organic materials
high aspect ratio
Nanotechnology
Powders
compatibility
Aspect ratio
corrosion

ASJC Scopus subject areas

  • !!Mechanical Engineering
  • !!Mechanics of Materials
  • !!Condensed Matter Physics
  • !!Materials Science(all)
  • !!Chemistry(all)

Dies zitieren

Stassen, I., Styles, M., Grenci, G., Van Gorp, H., Vanderlinden, W., De Feyter, S., ... Ameloot, R. (2016). Chemical vapour deposition of zeolitic imidazolate framework thin films. Nature Materials, 15(3), 304-310. https://doi.org/10.1038/nmat4509

Chemical vapour deposition of zeolitic imidazolate framework thin films. / Stassen, Ivo; Styles, Mark; Grenci, Gianluca; Van Gorp, Hans; Vanderlinden, Willem; De Feyter, Steven; Falcaro, Paolo; De Vos, Dirk; Vereecken, Philippe; Ameloot, Rob.

in: Nature Materials, Jahrgang 15, Nr. 3, 01.03.2016, S. 304-310.

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Stassen, I, Styles, M, Grenci, G, Van Gorp, H, Vanderlinden, W, De Feyter, S, Falcaro, P, De Vos, D, Vereecken, P & Ameloot, R 2016, 'Chemical vapour deposition of zeolitic imidazolate framework thin films' Nature Materials, Jg. 15, Nr. 3, S. 304-310. https://doi.org/10.1038/nmat4509
Stassen I, Styles M, Grenci G, Van Gorp H, Vanderlinden W, De Feyter S et al. Chemical vapour deposition of zeolitic imidazolate framework thin films. Nature Materials. 2016 Mär 1;15(3):304-310. https://doi.org/10.1038/nmat4509
Stassen, Ivo ; Styles, Mark ; Grenci, Gianluca ; Van Gorp, Hans ; Vanderlinden, Willem ; De Feyter, Steven ; Falcaro, Paolo ; De Vos, Dirk ; Vereecken, Philippe ; Ameloot, Rob. / Chemical vapour deposition of zeolitic imidazolate framework thin films. in: Nature Materials. 2016 ; Jahrgang 15, Nr. 3. S. 304-310.
@article{74a1f1b5ef1243f6b473fe4d5f1cbfe3,
title = "Chemical vapour deposition of zeolitic imidazolate framework thin films",
abstract = "Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.",
author = "Ivo Stassen and Mark Styles and Gianluca Grenci and {Van Gorp}, Hans and Willem Vanderlinden and {De Feyter}, Steven and Paolo Falcaro and {De Vos}, Dirk and Philippe Vereecken and Rob Ameloot",
year = "2016",
month = "3",
day = "1",
doi = "10.1038/nmat4509",
language = "English",
volume = "15",
pages = "304--310",
journal = "Nature Materials",
issn = "1476-1122",
publisher = "Nature Publishing Group",
number = "3",

}

TY - JOUR

T1 - Chemical vapour deposition of zeolitic imidazolate framework thin films

AU - Stassen, Ivo

AU - Styles, Mark

AU - Grenci, Gianluca

AU - Van Gorp, Hans

AU - Vanderlinden, Willem

AU - De Feyter, Steven

AU - Falcaro, Paolo

AU - De Vos, Dirk

AU - Vereecken, Philippe

AU - Ameloot, Rob

PY - 2016/3/1

Y1 - 2016/3/1

N2 - Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.

AB - Integrating metal-organic frameworks (MOFs) in microelectronics has disruptive potential because of the unique properties of these microporous crystalline materials. Suitable film deposition methods are crucial to leverage MOFs in this field. Conventional solvent-based procedures, typically adapted from powder preparation routes, are incompatible with nanofabrication because of corrosion and contamination risks. We demonstrate a chemical vapour deposition process (MOF-CVD) that enables high-quality films of ZIF-8, a prototypical MOF material, with a uniform and controlled thickness, even on high-aspect-ratio features. Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features. The compatibility of MOF-CVD with existing infrastructure, both in research and production facilities, will greatly facilitate MOF integration in microelectronics. MOF-CVD is the first vapour-phase deposition method for any type of microporous crystalline network solid and marks a milestone in processing such materials.

UR - http://www.scopus.com/inward/record.url?scp=84959540820&partnerID=8YFLogxK

U2 - 10.1038/nmat4509

DO - 10.1038/nmat4509

M3 - Article

VL - 15

SP - 304

EP - 310

JO - Nature Materials

JF - Nature Materials

SN - 1476-1122

IS - 3

ER -